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Electrochemical Society

Titles appearing in SciTech Book News — March 2008
Arrangement is by title.

Chemical solution deposition of semiconducting and non-metallic films; proceedings.

International symposium on Chemical Solution Deposition of Semiconducting and Non-Metallic... (2003: Paris, France) Ed. by D. Lincot et al. (Proceedings; v.2003-32)
Electrochemical Society, ©2006    234 p.    $91.00    TK7871
1-56677-433-0

Due to recent success in both CdTe and copper indium diselenide layers of thin film photovoltaic cells, chemical solution deposition (CSD), which is also known as chemical bath deposition (CBD) has received more attention lately than one would expect for a mature technology. In fact, the resurgence in interest has caused the 2003 symposium (the first about CSD/CBD) from which these papers are drawn. Topics include the mechanisms of the formation of microdispersed fine particles and of their deposition on solid surfaces, substrate effects in CBD deposition, industrial applications of CBD, laminated solar control glazing, buried interfaces, thin films in acidic baths containing proton scavengers, a first approach to the interface analysis of CBD buffer layers, evolution of thin film band structure with its optical based gap, preparation of thin films for deposition, and electrochemically induced co-precipitation of thin films on the zinc oxide/europium oxide system. (Annotation ©2008 Book News Inc. Portland, OR)

Corrosion and electrochemistry of advanced materials, in honor of Koji Hashimoto; proceedings.

Symposium Corrosion and Electrochemistry of Advanced Materials (2005: Los Angeles, CA) Ed. by S. Fujimoto et al. (ECS transactions; v.1, no.4)
Electrochemical Society, ©2006    546 p.    $114.00    TA418
978-1-56677-497-0

Hashimoto's fame started in the 1970s with his pioneering experiments in corrosion-resistant amorphous and nano-crystalline materials. This collection of 52 papers, presented at his October 2005 jubilee celebration and symposium in October 2005, reflects Hashimoto's influence well, with topics including amorphous and nano-crystalline materials (including pit initiation with solute-lean nanocrystals and oxidation and degassing behavior of rapidly solidified aluminum alloy powders), electrochemical behaviors of light and other metals (including data analysis methodology and work on aluminum, titanium and magnesium), atmospheric corrosion (including several on the effects of sea water), nonmetallic and electro-deposited materials (including thin films and zinc surfaces), oxide films and passivity breakdown (including self-organization of nanotube layers), localized corrosion, mechanical and chemical aspects of surface breakdown and advanced catalysts and electrode experiments (including a survey of corrosion prevention for renewable energy). Includes a charming biography of Hashimoto and event photos. (Annotation ©2008 Book News Inc. Portland, OR)

Microelectronics technology and devices; proceedings.

International symposium on Microelectronics Technology and Devices (21th: 2006: Ouro Preto, Brazil) Ed. by J. Diniz et al. (ECS transactions; v.4, no.1)
Electrochemical Society, ©2006    585 p.    $127.00    TK7874
1-56677-512-4

Papers from a recent symposium highlight current work in technology, devices, systems, modeling, and characterization directly or indirectly related to microelectronics. Papers are in sections on process integration and devices, MEMS devices and processing issues, modeling and characterization, nanostructures and devices, thin films and fabrication processes, and plasma characterization and applications. Specific topics examined include a UV bandpass optical filter for microspectrometers, rapid prototyping of microfluidic systems, modeling of advanced semiconductor devices, and influence of the tunneling gate current in C-V curves. Other subjects are microsensors for multiple-parameter medical measurements, fractal carbon-MEMs electrodes, and a relative humidity sensor based on rough polysilicon thin films. (Annotation ©2008 Book News Inc. Portland, OR)

Pits and pores III; formation, properties, and significance for advanced materials; proceedings.

Int'l Symposium on Pits and Pores: Formation, Properties, and Significance for... (3d: 2004: Honolulu, Hawai) Ed. by P. Schmuiki et al. (Proceedings; v.2004-19)
Electrochemical Society, ©2006    490 p.    $104.00    TA418
1-56677-474-8

How materials respond to conditions, how failures form, and how those failures are characterized are important in considerations of advanced materials for applications; an incorrect choice can reduce yields and reliability or even stop a product from reaching the market. These proceedings include papers presented at the October 2004 symposium on the formation, properties and significance of pits and pores in advanced materials, and include such topics as the electrochemistry of pit formation and growth, nano-scalable surface features formed on aluminum by dissolution processes, electrochemical processes for Cu and Ni nanowire arrays, nanostructures on silicon electrodes, the morphology of porous layers formed locally, the role of chloride ions in passivity breakdowns on nickel, observations of metal states in the pitting of stainless steel, corrosion behaviors in copper-rich model alloys, and pitting of laser welded steels. (Annotation ©2008 Book News Inc. Portland, OR)

Proton exchange membrane fuel cells 6; proceedings.

Electrochemical Society Conference (210th); Congreso de la Sociedad Mexicana de Electroquimica (2006: 21st: Cancun, Mexico) (ECS transactions; v.3, no.1)
Electrochemical Society, ©2006    1365 p.    $158.00    TK2931
978-1-56677-501-4

The over 200 papers of this proceedings were held at the 6th Symposium on Proton Exchange Membrane Fuel Cells, which occurred during the 210th International Conference of the Electrochemical Society and the XXI Congreso de la Sociedad Mexicana de Electroquimica, held in Cancun, Mexico in October 2006. The papers are organized by session, with session topics that included noble and non-noble metal catalysts for ORR, catalyst supports and electrodes, gas diffusion layers, electrode degradation, and dynamics in fuel cell components and systems. The volume is author indexed only. (Annotation ©2008 Book News Inc. Portland, OR)

Proton exchange membrane fuel cells 7; 2v.; proceedings.

Electrochemical Society meeting (212th: 2007: Washington D.C) Proton Exchange Membrane Fuel Cells symposium (7th) Ed. by T. Fuller et al. (ECS transactions; v.11, no.1)
Electrochemical Society, ©2007    1557 p.    $182.00    TK2931
978-1-56677-567-0

This two volume set assembles 152 research papers on proton exchange membrane fuel cells presented at an October 2007 symposium (at the 212th Meeting of the Electrochemical Society) that was sponsored by the Society's divisions on energy technology, industrial electrolysis and electrochemical engineering, physical and analytical electrochemistry, and battery. The papers are organized into sections covering proton conducting materials (membranes); proton conducting materials (composited membranes and electrolytes); platinum and platinum-alloy catalysts for the oxygen reduction reaction; non- platinum catalysts for the oxygen reduction reaction; performance and durability of anode catalysts; catalyst support and electrodes; component, stack, and system tools/diagnostics; impact of freezing temperatures on proton exchange membrane fuel cells; water transport proton exchange membrane fuel cells; modeling of water transport proton exchange membrane fuel cells; and component, stack, and system modeling. (Annotation ©2008 Book News Inc. Portland, OR)

Proton exchange membrane fuel cells V, in honor of Supramaniam Srinivasan; proceedings.

International symposium on Proton Exchange Membrane Fuel Cells (2005: Los Angeles, CA) Ed. by T. Fuller et al. (ECS transactions; v.1, no.6)
Electrochemical Society, ©2006    627 p.    $124.00    TK2931
1-56677-496-9

Sixty papers from the October 2005 symposium discuss the electrode, material, and design issues that must be resolved before polymer electrolyte membrane fuel cells (PEMFC) satisfy military needs and become commercial in automobiles. A session on direct methanol fuel cells presents recent research on electrocatalysts, polymer membranes, the passivation of stainless steel, fuel modification to reduce crossover, ruthenium dissolution, and membrane electrode assembly. Other topics include fullerene-Nafion composite membranes, mathematical analysis of membrane water content, comparison of Maxwell-Stefan and CFD approximation equations, and measurement of fuel cell flowfields using particle image velocimetry. No subject index is provided. (Annotation ©2008 Book News Inc. Portland, OR)

Semiconductor wafer bonding 9; science, technology, and applications; proceedings.

International Symposium on Semiconductor Wafer Bonding (9th: 2006: Cancun, Mexico) Ed. by H. Baumgart et al. (ECS transactions; v.3, no.6)
Electrochemical Society, ©2006    386 p.    $84.00    TK7871
1-56677-506-X

Originating as a purely academic topic, this process quickly succeeded in a wide range of application and high volumes in industry. In these 40 papers from the autumn 2006 meeting, contributors address continued research in advanced device applications, (including new extensions of Moore's Law, devices obtained by the bonding and thinning method, and thin film transfer for the fabrication of multiple gate MOS transistors), advanced materials (including a new generation of structures obtained by direct bonding of processed wafers), low-temperature/plasma wafer bonding (including void-free hydrophilic or hydrophobic silicon direct bonding), interfacial properties (including rough surface adhesion mechanisms for wafer bonding), photonic applications of wafer bonding (including a review of compound materials bonding and layer transfer for optoelectronic applications), and wafer bonding for MEMs applications (including wafer bonding challenges and potential in industrial MEMS processing and low-temperature plasma-assisted wafer bonding for MEMS). (Annotation ©2008 Book News Inc. Portland, OR)

Silicon materials science and technology; proceedings.

International Symposium on Silicon Materials Science and Technology (10th: 2006: Denver, CO) Ed. by H. Huff et al. (ECS transactions; v.2, no.2)
Electrochemical Society, ©2006    581 p.    $102.00    TK7871
978-1-56677-439-0

Proceedings of an symposium held in Denver, Colorado, in May 2006. Following the four plenary presentations, the remaining 45 contributions are organized into sections on 300 mm wafers, process development and modeling, materials and process integration, integrated metrology and diagnostics, and strained silicon. A sampling of topics: present and future of Si-based transistor technology for memories; parameters of intrinsic point defects in silicon based on crystal growth, wafer processing, self- and metal- diffusion; wafer strength and slip generation behavior in 300 mm wafers; growth kinetics and electrical properties of ultrathin silicon dioxide layers; mobility enhancement and strain integration in advanced CMOS; breakthrough of in-line inspection technology in volume production for 65 nm node and beyond; and local strain measurement on strained Si/SiGe heterostructures using convergent beam electron diffraction analysis. No subject index. (Annotation ©2008 Book News Inc. Portland, OR)